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Naulleau, Patrick

TitlePhysicist Senior Sci/Engr
InstitutionLawrence Berkeley National Lab
DepartmentMaterials Sciences
Address1 Cyclotron Road
Berkeley CA 94720
Phone510/486-4529
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    Publications listed below are automatically derived from MEDLINE/PubMed and other sources, which might result in incorrect or missing publications. Researchers can login to make corrections and additions, or contact us for help.
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    1. Naulleau P, Wang YG, Pistor T. Extreme ultraviolet mask roughness effects in high numerical aperture lithography. Appl Opt. 2018 Mar 01; 57(7):1724-1730. PMID: 29522026.
      View in: PubMed
    2. Closser KD, Ogletree DF, Naulleau P, Prendergast D. The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials. J Chem Phys. 2017 Apr 28; 146(16):164106. PMID: 28456207.
      View in: PubMed
    3. Naulleau P, Benk M, Goldberg KA, Gullikson EM, Wojdyla A, Wang YG, Neureuther A. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. Appl Opt. 2017 Apr 20; 56(12):3325-3328. PMID: 28430243.
      View in: PubMed
    4. Claus RA, Naulleau P, Neureuther AR, Waller L. Quantitative phase retrieval with arbitrary pupil and illumination. Opt Express. 2015 Oct 05; 23(20):26672-82. PMID: 26480180.
      View in: PubMed
    5. Ashby PD, Olynick DL, Ogletree DF, Naulleau P. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning. Adv Mater. 2015 Oct 14; 27(38):5813-9. PMID: 26079187.
      View in: PubMed
    6. Le Gros MA, McDermott G, Cinquin BP, Smith EA, Do M, Chao WL, Naulleau P, Larabell CA. Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source. J Synchrotron Radiat. 2014 Nov; 21(Pt 6):1370-7. PMID: 25343808; PMCID: PMC4211134.
    7. Naulleau P, Anderson CN, Anderson EH, Andreson N, Chao W, Choi C, Goldberg KA, Gullikson EM, Kim SS, Lee D, Miyakawa R, Park J, Rekawa S, Salmassi F. Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source. Opt Express. 2014 Aug 25; 22(17):20144-54. PMID: 25321224.
      View in: PubMed
    8. Miyakawa R, Mayer R, Wojdyla A, Vannier N, Lesser I, Aron-Dine S, Naulleau P. Coded aperture detector: an image sensor with sub 20-nm pixel resolution. Opt Express. 2014 Aug 11; 22(16):19803-9. PMID: 25321062.
      View in: PubMed
    9. Goldstein M, Naulleau P. Actinic microscope for extreme ultraviolet lithography photomask inspection and review. Opt Express. 2012 Jul 02; 20(14):15752-68. PMID: 22772266.
      View in: PubMed
    10. Chao W, Fischer P, Tyliszczak T, Rekawa S, Anderson E, Naulleau P. Real space soft x-ray imaging at 10 nm spatial resolution. Opt Express. 2012 Apr 23; 20(9):9777-83. PMID: 22535070.
      View in: PubMed
    11. Naulleau P, Mochi I, Goldberg KA. Optical modeling of Fresnel zoneplate microscopes. Appl Opt. 2011 Jul 10; 50(20):3678-84. PMID: 21743581.
      View in: PubMed
    12. Naulleau P, George SA. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations. Appl Opt. 2011 Jul 01; 50(19):3346-50. PMID: 21743539.
      View in: PubMed
    13. Naulleau P. Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography. Appl Opt. 2009 Jun 20; 48(18):3302-7. PMID: 19543335.
      View in: PubMed
    14. Brizuela F, Wang Y, Brewer CA, Pedaci F, Chao W, Anderson EH, Liu Y, Goldberg KA, Naulleau P, Wachulak P, Marconi MC, Attwood DT, Rocca JJ, Menoni CS. Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination. Opt Lett. 2009 Feb 01; 34(3):271-3. PMID: 19183628.
      View in: PubMed
    15. Goldstein M, Hudyma R, Naulleau P, Wurm S. Extreme-ultraviolet microexposure tool at 0.5 NA for sub-16 nm lithography. Opt Lett. 2008 Dec 15; 33(24):2995-7. PMID: 19079518.
      View in: PubMed
    16. Naulleau P, Gullikson EM, Aquila A, George S, Niakoula D. Absolute sensitivity calibration of extreme ultraviolet photoresists. Opt Express. 2008 Jul 21; 16(15):11519-24. PMID: 18648473.
      View in: PubMed
    17. Anderson CN, Naulleau P. Tilt sensitivity of the two-grating interferometer. Appl Opt. 2008 Mar 20; 47(9):1327-35. PMID: 18709081.
      View in: PubMed
    18. Anderson CN, Naulleau P. Sensitivity study of two high-throughput resolution metrics for photoresists. Appl Opt. 2008 Jan 01; 47(1):56-63. PMID: 18157277.
      View in: PubMed
    19. Naulleau P, Salmassi F, Gullikson EM, Liddle JA. Design and fabrication of a high-efficiency extreme-ultraviolet binary phase-only computer-generated hologram. Appl Opt. 2007 May 10; 46(14):2581-5. PMID: 17446905.
      View in: PubMed
    20. Salmassi F, Naulleau P, Gullikson EM. Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet region. Appl Opt. 2006 Apr 10; 45(11):2404-8. PMID: 16623236.
      View in: PubMed
    21. Naulleau P, Cain JP, Goldberg KA. Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator. Appl Opt. 2006 Mar 20; 45(9):1957-63. PMID: 16579565.
      View in: PubMed
    22. Naulleau P. Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography. Appl Opt. 2005 Jan 10; 44(2):183-9. PMID: 15678769.
      View in: PubMed
    23. Naulleau P, Liddle JA, Salmassi F, Anderson EH, Gullikson EM. Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers. Appl Opt. 2004 Oct 01; 43(28):5323-9. PMID: 15495422.
      View in: PubMed
    24. Naulleau P. Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests. Appl Opt. 2004 Jul 10; 43(20):4025-32. PMID: 15285094.
      View in: PubMed
    25. Naulleau P. Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist. Appl Opt. 2004 Feb 01; 43(4):788-92. PMID: 14960071.
      View in: PubMed
    26. Mercère P, Zeitoun P, Idir M, Le Pape S, Douillet D, Levecq X, Dovillaire G, Bucourt S, Goldberg KA, Naulleau P, Rekawa S. Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy. Opt Lett. 2003 Sep 01; 28(17):1534-6. PMID: 12956370.
      View in: PubMed
    27. Naulleau P, Gallatin GM. Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization. Appl Opt. 2003 Jun 10; 42(17):3390-7. PMID: 12816326.
      View in: PubMed
    28. Chang C, Naulleau P, Attwood D. Analysis of illumination coherence properties in small-source systems such as synchrotrons. Appl Opt. 2003 May 10; 42(14):2506-12. PMID: 12749562.
      View in: PubMed
    29. Naulleau P, Goldberg KA, Batson P, Bokor J, Denham P, Rekawa S. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography. Appl Opt. 2003 Feb 10; 42(5):820-6. PMID: 12593485.
      View in: PubMed
    30. Chang C, Naulleau P, Anderson E, Rosfjord K, Attwood D. Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengths. Appl Opt. 2002 Dec 10; 41(35):7384-9. PMID: 12502293.
      View in: PubMed
    31. Goldberg KA, Naulleau P, Bokor J. Fourier transform interferometer alignment method. Appl Opt. 2002 Aug 01; 41(22):4477-83. PMID: 12153074.
      View in: PubMed
    32. Chang C, Anderson E, Naulleau P, Gullikson E, Goldberg K, Attwood D. Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer. Opt Lett. 2002 Jun 15; 27(12):1028-30. PMID: 18026354.
      View in: PubMed
    33. Naulleau P, Goldberg KA, Batson PJ, Jeong S, Underwood JH. Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology. Appl Opt. 2001 Aug 01; 40(22):3703-9. PMID: 18360402.
      View in: PubMed
    34. Lee SH, Naulleau P, Goldberg KA, Cho CH, Jeong S, Bokor J. Extreme-ultraviolet lensless Fourier-transform holography. Appl Opt. 2001 Jun 01; 40(16):2655-61. PMID: 18357280.
      View in: PubMed
    35. Naulleau P, Cho CH, Gullikson EM, Bokor J. Transmission phase gratings for EUV interferometry. J Synchrotron Radiat. 2000 Nov 01; 7(Pt 6):405-10. PMID: 16609228.
      View in: PubMed
    36. Lee SH, Naulleau P, Goldberg KA, Piao F, Oldham W, Bokar J. Phase-shifting point-diffraction interferometry at 193 nm. Appl Opt. 2000 Nov 01; 39(31):5768-72. PMID: 18354576.
      View in: PubMed
    37. Naulleau P, Goldberg KA, Gullikson EM, Bokor J. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. Appl Opt. 2000 Jun 10; 39(17):2941-7. PMID: 18345220.
      View in: PubMed
    38. Naulleau P, Goldberg KA, Lee SH, Chang C, Attwood D, Bokor J. Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy. Appl Opt. 1999 Dec 11; 38(35):7252-63. PMID: 18324274.
      View in: PubMed
    39. Naulleau P, Goldberg KA. Dual-domain point diffraction interferometer. Appl Opt. 1999 Jun 01; 38(16):3523-33. PMID: 18319953.
      View in: PubMed
    40. Leith EN, Hoover BG, Dilworth DS, Naulleau P. Ensemble-averaged Shack-Hartmann wave-front sensing for imaging through turbid media. Appl Opt. 1998 Jun 10; 37(17):3643-50. PMID: 18273334.
      View in: PubMed
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