Benk, Markus

TitlePhysicist Project Sci/Engr
InstitutionLawrence Berkeley National Lab
DepartmentMaterials Sciences
Address1 Cyclotron Road
Berkeley CA 94720
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    1. Naulleau PP, Benk M, Goldberg KA, Gullikson EM, Wojdyla A, Wang YG, Neureuther A. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. Appl Opt. 2017 Apr 20; 56(12):3325-3328. PMID: 28430243.
      View in: PubMed
    2. Benk M, Bergmann K. Adaptive spatially resolving detector for the extreme ultraviolet with absolute measuring capability. Rev Sci Instrum. 2009 Mar; 80(3):033113. PMID: 19334913.
      View in: PubMed
    3. Benk M, Bergmann K, Schäfer D, Wilhein T. Compact soft x-ray microscope using a gas-discharge light source. Opt Lett. 2008 Oct 15; 33(20):2359-61. PMID: 18923622.
      View in: PubMed
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