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    Sassolini, Simone

    TitleSr Scientific Engr Assoc
    SchoolLawrence Berkeley National Lab
    DepartmentMolecular Foundry
    Address1 Cyclotron Road
    Berkeley CA 94720
    Phone510/486-4820
    vCardDownload vCard

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      Collapse Publications
      Publications listed below are automatically derived from MEDLINE/PubMed and other sources, which might result in incorrect or missing publications. Researchers can login to make corrections and additions, or contact us for help.
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      1. Calafiore G, Koshelev A, Darlington TP, Borys NJ, Melli M, Polyakov A, Cantarella G, Allen FI, Lum P, Wong E, Sassolini S, Weber-Bargioni A, Schuck PJ, Cabrini S, Munechika K. Campanile Near-Field Probes Fabricated by Nanoimprint Lithography on the Facet of an Optical Fiber. Sci Rep. 2017 May 10; 7(1):1651. PMID: 28490793.
        View in: PubMed
      2. Staaks D, Yang X, Lee KY, Dhuey SD, Sassolini S, Rangelow IW, Olynick DL. Low temperature dry etching of chromium towards control at sub-5 nm dimensions. Nanotechnology. 2016 Oct 14; 27(41):415302. PMID: 27606715.
        View in: PubMed
      3. Calafiore G, Koshelev A, Allen FI, Dhuey S, Sassolini S, Wong E, Lum P, Munechika K, Cabrini S. Nanoimprint of a 3D structure on an optical fiber for light wavefront manipulation. Nanotechnology. 2016 Sep 16; 27(37):375301. PMID: 27501300.
        View in: PubMed
      4. Koshelev A, Calafiore G, Piña-Hernandez C, Allen FI, Dhuey S, Sassolini S, Wong E, Lum P, Munechika K, Cabrini S. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications. Opt Lett. 2016 Aug 01; 41(15):3423-6. PMID: 27472584.
        View in: PubMed
      5. Calafiore G, Fillot Q, Dhuey S, Sassolini S, Salvadori F, Mejia CA, Munechika K, Peroz C, Cabrini S, Piña-Hernandez C. Printable photonic crystals with high refractive index for applications in visible light. Nanotechnology. 2016 Mar 18; 27(11):115303. PMID: 26875825.
        View in: PubMed
      6. Liu Z, Gu X, Hwu J, Sassolini S, Olynick DL. Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns. Nanotechnology. 2014 Jul 18; 25(28):285301. PMID: 24971641.
        View in: PubMed
      7. Glaeser RM, Sassolini S, Cambie R, Jin J, Cabrini S, Schmid AK, Danev R, Buijsse B, Csencsits R, Downing KH, Larson DM, Typke D, Han BG. Minimizing electrostatic charging of an aperture used to produce in-focus phase contrast in the TEM. Ultramicroscopy. 2013 Dec; 135:6-15. PMID: 23872037; PMCID: PMC3818313.

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